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High Purity V Vanadium Plate Sputtering Target

USD 20.00 – 200.00 / piece
Price varies by quantity and specifications
MOQ 1 piece
Stock 0 piece
Category Electronics
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Product Description

This high purity vanadium plate sputtering target is manufactured with 99.9% to 99.95% purity and is suitable for thin film deposition applications. It is customizable in size, comes with TUV, ISO, and CE certifications, and includes a certificate for each target.
High Purity V Vanadium Plate Sputtering Target
High Purity V Vanadium Plate Sputtering Target

Technical Specifications

Model NO.XK-V
TypeMetal Target
CertificationTUV, ISO, CE
Purity99.9%-99.95%
SizeCustomized
MOQ1 PC
Free SampleAccept
PackingWooden Case
CertificateProvide for Each Target
Transportby Air
Delivery5-10 Days
Transport PackageVacuum Sealed
Specificationcustomized
Trademarkno
OriginChina
HS Code8486909900
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High Purity V Vanadium Plate Sputtering Target
High Purity V Vanadium Plate Sputtering Target
USD 20.00 / piece
piece